Plasma-chemical vapor deposition abbr., PHO; PCGFO otherwise plasma chemical vapor deposition ; plasma-enhanced chemical vapor deposition is a process of chemical vapor deposition of thin films from a vapor phase at low pressure using high-frequency plasma [1] .
Content
- 1 Description
- 2 See also
- 3 notes
- 4 Literature
Description
Plasma-chemical deposition technology uses a gas discharge plasma to decompose the reaction gas into active radicals . The use of various methods of plasma excitation in the reaction volume and control of its parameters allows:
- intensify the growth processes of coatings;
- carry out the deposition of amorphous and polycrystalline films at significantly lower substrate temperatures;
- better control the formation of a given microrelief, structure, impurity composition and other characteristics of the coating compared to similar processes in chemical vapor deposition (CVD), based on thermal decomposition of the reaction gas [1] .
This method successfully produces diamond-like coatings .
See also
- Chemical vapor deposition
- Ion sputtering
- Ion implantation
- Plasma-chemical synthesis of nanopowders
- Finish plasma hardening
Notes
- ↑ 1 2 Zhuravleva Natalya Gennadievna, Naimushina Daria Anatolyevna. Plasma-chemical vapor deposition, "Dictionary of nanotechnological terms" . Rusnano . Date of treatment August 21, 2012. Archived November 1, 2012.
Literature
- Kireev V., Stolyarov A. Technologies of microelectronics. Chemical vapor deposition. - M .: Technosphere, 2006 .-- 192 p. - ISBN 5-94836-039-3 .
- STC Nanotechnology, 2006. - www.nano.org.ua
- Advanced plasma technologies // Intech, 2008. - www.plasmasystem.ru
- D. Tolliver, R. Novicki, D. Hess, and others; Ed. N. Ainspruck, D. Brown. Plasma technology in the production of VLSI. - M .: Mir, 1987 .-- 469 p.
- Danilin B.S. The use of low-temperature plasma for applying thin films. - M .: Energoatomizdat, 1989 .-- 328 p.
- Ivanovsky G.F., Petrov V.I. Ion-plasma processing of materials. - M .: Radio and communications, 1986. - 232 p.
- Popov V.F., Gorin Yu.N. Processes and installations of electron-ion technology. - M .: Higher. school, 1988 .-- 255 p. - ISBN 5-06-001480-0 .
- Vinogradov M.I., Maishev Yu.P. Vacuum processes and equipment of ion - and electron-beam technology. - M .: Engineering, 1989 .-- 56 p. - ISBN 5-217-00726-5 .
- Sosnin N.A., Ermakov S.A., Topolyansky P.A. Plasma technologies . Manual for engineers. Publishing House of the Polytechnic University. SPb .: 2013 .-- 406 p.