Fluoroform is the trivial name for trifluoromethane ( Freon 23, Freon 23, R23, HFC 23). Fluoroform is an organofluorine compound belonging to the fluorinated hydrocarbons of the methane series. Fluoroform is used as a high-pressure refrigerant to obtain temperatures up to minus 100 ° C and a dry etching reagent in the manufacture of ultra-large integrated circuits. [one]
| Fluoroform | |
|---|---|
| Are common | |
| Systematic name | trifluoromethane |
| Abbreviations | R-23, HFC-23, |
| Traditional names | freon 23 |
| Chem. formula | CHF₃ |
| Physical properties | |
| condition | colorless gas |
| Molar mass | 70.0141 g / mol |
| Density | 0.516 g / cm³ |
| Dynamic viscosity | 14.4 · 10 −6 Pa · s |
| Thermal properties | |
| T. melt. | −155.2 ° C |
| T. bale. | −82.1 ° C |
| Cr. point | 32.3 ° C, 50.5 atm |
| Cr. pace. | 25.7 ° C |
| Cr. pressure | 4.816 MPa |
| Like heat resistant. | 51.577 J / (mol · K) |
| Specific Heat of Evaporation | 257.91 J / kg |
| Chemical properties | |
| Solubility in other substances | soluble in organic compounds |
| Structure | |
| Dipole moment | 1,649 D |
| Classification | |
| Reg. CAS number | |
| PubChem | |
| Reg. EINECS number | |
| Smiles | |
| Inchi | |
| Reg. EC number | 200-872-4 |
| RTECS | PB6900000 |
| Chebi | and |
| ChemSpider | |
| Security | |
| Toxicity | 0 2 0 |
Fluoroform CHF 3 ( trifluoromethane ) is a chemical organic inert compound . The compound is one of the haloforms ; a class of compounds of the formula C H X 3 (where X is halogen ).
Fluoroform is used in various fields and is produced as a by-product of Teflon production. It is also created biologically in small amounts, apparently during decarboxylation of trifluoroacetic acid .
Properties
- Heat of formation ΔH ° 298 : 162.6 ± 0.6 kcal / mol,
- Specific heat: 0.28 kcal / kg
- Steam pressure:
.
Unlike chloroform , hydrogen protonization does not occur under the action of alkalis.
Industrial Application
CHF 3 is used in the semiconductor industry for plasma etching of silicon oxide and silicon nitride . Known as R-23 or HFC-23 as a high-pressure refrigerant (mainly for low temperatures, up to about −100 ° C), and sometimes as a replacement for trifluorochloromethane , which is a by-product of its production.
When used as a fire extinguishing agent, fluoroform has the brand name of DuPont - FE-13. Fluoroform is recommended for these purposes because of its low toxicity , low reactivity and high density.
Organic Chemistry
CHF 3 is a reagent for creating sources of "CF 3 - " for deprotonation . The molecule is low toxic and has a pK a = 25-28. This substance is a precursor for the production of CF 3 Si (CH 3 ) 3
Synthesis
Fluoroform was first obtained by Maurice Meslans as a result of a violent reaction of iodoform with dry silver fluoride in 1894. The reaction was improved by Otto Raff by replacing silver fluoride with a mixture of mercury fluoride and calcium fluoride . The exchange reaction occurs between iodoform and bromoform , as well as during the exchange of the first two halogen fluorine atoms.
Fluoroform is obtained by the action of SbF 3 Cl 2 • 2HF on chloroform ; it is formed by the action of HgF 2 on CHBrF 2 ; under the action of alkalis on trifluoromethyl- containing carbonyl compounds : , as well as trifluoromethyl derivatives of some cements:
Trifluoromethane as a Greenhouse Gas
CHF 3 is a powerful greenhouse gas . Was given [by whom? ] assessment of the comparison of carbon dioxide and trifluoromethane for atmospheric effects: one ton of trifluoromethane has the same effect as 11,700 tons of carbon dioxide. More recent work has shown that this equivalence in the GWP rating is slightly greater than 14,800 for trifluoromethane. The lifetime of trifluoromethane in the atmosphere will be 270 years.
Developing countries have become the largest producers of fluoroform in recent years, according to the secretariat of the World Meteorological Organization. Fluoroform emissions are accounted for in the Kyoto Protocol . To mitigate the detrimental effects of this gas, fluoroform can be destroyed using electric plasma technology or burning at high temperatures.
Additional Physical Properties
| Property | Value |
|---|---|
| Density (ρ) at −100 ° C (liquid) | 1.52 g / cm³ |
| Density (ρ) at −82.1 ° C (liquid) | 1.431 g / cm³ |
| Density (ρ) at −82.1 ° C (gas) | 4.57 kg / m³ |
| Density (ρ) at 0 ° C (gas) | 2.86 kg / m³ |
| Density (ρ) at 15 ° C (gas) | 2.99 kg / m³ |
| Critical density (ρ c ) | 7.52 mol / liter |
| Compressibility factor (Z) | 0.9913 |
| Peripheral Factor (ω) | 0.26414 |
Notes
- ↑ Organofluorine Industrial Products: Ref. Edition / B.N. Maksimov, V.G. Barabanov, I.L. Serushkin et al. - 2nd ed., trans. and additional .. - St. Petersburg: "Chemistry", 1996. - 544 p. - ISBN 5-7245-1043-X .
See also
- Freons
- Organofluorine compounds